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Using the Lab
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MATFab Policies and Procedures
Instruments in Depth
Atomic Layer Deposition
BET
Combustion Elemental Analyzer
Electron Beam Deposition
Electron Microprobe
Ellipsometer
High Resolution ICP-MS
ICP MS
ICP OES
ICP Reactive Ion Etcher
Micro Computed Tomography
Nanonex -NX-1000 NanoImprint
OAI Mask Aligner
Powder X-ray Diffraction
Raman Microscope
Raith E-Beam Lithography
Reactive Ion Etcher
Scanning Electron Microscope
Single-crystal X-ray diffraction
Sputterer
TGA/DSC
X-ray Fluorescence Spectrometry
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Michael Sinnwell, Ph.D.
Core Facility Research Specialist
michael-sinnwell@uiowa.edu
