• Imprint of features size down to 6 nm demonstrated
• Full-wafer nanoimprinting tool for thermoplastic and thermal curable resists
• Patented Air Cushion PressTM (ACP) for ultimate nanoimprint uniformity
• High throughput due to full-wafer imprinting and minimized thermal mass
• Smart Sample Holder for handling different sizes and irregular shapes
This instrument is housed in IATL 174 and is managed by Schaffer Finney.