• Beam energy and current range: 50 KV, 50pA-40 nA
• Beam size: less than 2.5 nm
• Scan frequency: 50 MHz
• Write-field size (Max): 500 x 500 microns
• Field stich and overlay accuracy: less than 35 nm
• Minimum guaranteed linewidth: 10 nm
• Wafer/sample size: 0.3 x 0.3 in sample size to 6 in wafer
This instrument is housed in IATL 172 and is managed by Schaffer Finney.